Design of Transparent and Thermally Stable Photo-Acid Generators for 193-nm Lithography.

TiSi-nitride attenuating phase-shift photomask for 193 nm lithography

G. A. M. Reynolds, R. H. French, P. F. Carcia, C. C. Torardi, G. Hughes, D. J. Jones, M. F. Lemon, M. Reilly, L. Wilson, C. R. Miao “TiSi-nitride attenuating phase-shift photomask for 193 nm lithography”, 18th Annual BACUS Symposium on Photomask Technology and Management, SPIE Vol. 3546, Edited by B. J. Grenon, F. E. Abboud, 514-23, (1998). TiSi-nitride attenuating phase-shift photomask for 193...

Alternatives to Chemical Amplification for 193 nm Lithography

Research has been conducted to develop alternatives to chemically amplified 193 nm photoresist materials that will be able to achieve the requirements associated with sub-32 nm device technology. New as well as older photoresist design concepts for non-chemically amplified 193 nm photoresists that have the potential to enable improvements in line edge roughness while maintaining adequate sensit...

Dissolution behavior of chemically amplified resist polymers for 248-, 193-, and 157-nm lithography

Dissolution behavior of chemically amplified resist polymers for 248-, 193-, and 157-nm lithography The aqueous base development step is one of the most critical processes in modern lithographic imaging technology. Sinusoidal modulation of the exposing light intensity must be converted to a step function in the resist film during the development process. Thus, in designing high-performance resi...

Challenges of laser spectrum metrology in 248 and 193-nm lithography

ABSTRACT Several approaches for high-resolution laser metrology have been discussed. One approach is to use a multiple-etalon spectrometer, which has two or more etalons with different FSRs. This approache can increase both the resolution at FWHM and the tails, as well as increase the spectrum range of the instrument. With the proper alignment, this multiple etalon configuration can produce an ...

Scale-space Analysis of Line Edge Roughness on 193 nm Lithography Test Structures